Atomically engineered metal-insulator transition at the TiO2/LaAlO3 heterointerface
Atomically engineered metal-insulator transition at the TiO2/LaAlO3 heterointerface
M. Minohara, T. Tachikawa, Y. Nakanishi, Y. Hikita, L. F. Kourkoutis, J-S. Lee, C-C. Kao, M. Yoshita, H. Akiyama, C. Bell, H. Y. Hwang
Nano Lett. 14, 6743 (2014)