Atomically precise interfaces from non-stoichiometric deposition

Chris Lastovicka January 28, 2021January 28, 2021 Publications

Atomically precise interfaces from non-stoichiometric deposition
Y. F. Nie, Y. Zhu, C.-H. Lee, L. F. Kourkoutis, J. A. Mundy, J. Junquera, Ph. Ghosez, D. J. Baek, S. Sung, X. X. Xi, K. M. Shen, D. A. Muller, D. G. Schlom
Nat. Commun. 5, 4530 (2014)

Atomically precise interfaces from non-stoichiometric deposition

Tagged on: 2014

← Visualizing the interfacial evolution from charge compensation to metallic screening across the manganite metal–insulator transition
Atomically engineered metal-insulator transition at the TiO2/LaAlO3 heterointerface →