Germanium dioxide: A new rutile substrate for epitaxial film growth
S. Chae, L. A. Pressley, H. Park, J. Gim, D. Werder, B. H. Goodge, L. F. Kourkoutis, R. Hovden, T. M. McQueen, E. Kioupakis, J. T. Heron
Journal of Vacuum Science & Technology A 40, 050401 (2022)
Germanium dioxide: A new rutile substrate for epitaxial film growth