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Germanium dioxide: A new rutile substrate for epitaxial film growth

Lena F. Kourkoutis September 8, 2022September 8, 2022 Publications

GeO2 crystals and AFB STEM imageGermanium dioxide: A new rutile substrate for epitaxial film growth
S. Chae, L. A. Pressley, H. Park, J. Gim, D. Werder, B. H. Goodge, L. F. Kourkoutis, R. Hovden, T. M. McQueen, E. Kioupakis, J. T. Heron
Journal of Vacuum Science & Technology A 40, 050401 (2022)

Germanium dioxide: A new rutile substrate for epitaxial film growth
Tagged on: 2022
  • ← Geometric Frustration of Jahn-Teller order and ice rules in the infinite-layer lattice
  • Atomic-scale mapping and quantification of local Ruddlesden-Popper phase variations →

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